发明名称 Semiconductor device and manufacturing method thereof
摘要 The invention provides a novel memory for which process technology is relatively simple and which can store multivalued information by a small number of elements. A part of a shape of the first electrode in the first storage element is made different from a shape of the first electrode in the second storage element, and thereby voltage values which change electric resistance between the first electrode and the second electrode are varied, so that one memory cell stores multivalued information over one bit. By partially processing the first electrode, storage capacity per unit area can be increased.
申请公布号 US7605410(B2) 申请公布日期 2009.10.20
申请号 US20070702083 申请日期 2007.02.05
申请人 发明人 TAKANO TAMAE;KATO KIYOSHI;KUWABARA HIDEAKI
分类号 H01L29/92;H01L29/00 主分类号 H01L29/92
代理机构 代理人
主权项
地址