发明名称 Methods of fabricating substrates including one or more conductive vias
摘要 Substrate precursor structures include a substrate blank having at least one aperture extending substantially through the substrate blank. At least a portion of at least one conductive layer covers a surface of the at least one aperture of the substrate blank. A mask pattern covers a portion of the at least one conductive layer and exposes another portion of the at least one conductive layer to define at least one conductive element, at least a portion of which extends over the surface of the at least one aperture.
申请公布号 US7603772(B2) 申请公布日期 2009.10.20
申请号 US20070717946 申请日期 2007.03.13
申请人 MICRON TECHNOLOGY, INC. 发明人 FARNWORTH WARREN M.;MCDONALD STEVEN M.;SINHA NISHANT;HIATT WILLIAM M.
分类号 H01K3/10;H01B13/00;H01L21/48;H01L23/14;H01L23/15;H01L23/498;H05K3/06;H05K3/10;H05K3/24;H05K3/42 主分类号 H01K3/10
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