PURPOSE: A method for forming a thin film pattern is provided to reduce a process device and a process step for manufacturing a pattern by selectively forming a thin film pattern on a surface of a substrate. CONSTITUTION: A substrate(100) is prepared. A surface of the substrate is divided into a hydrophilic region(400) and a hydrophobic region(300). A thin film forming material(500) having one property of a hydrophilic property and a hydrophobic property is coated on the surface of the substrate divided into the hydrophilic region and the hydrophobic region. A thin film is formed on one of the hydrophilic region and the hydrophobic region of the surface of the substrate.
