| 摘要 |
<p>PURPOSE: A positioning system, a lithographic apparatus and a device manufacturing method are provided to compensate the torque generated from a substrate support frame(WT) and a balance mass by an offset torque. CONSTITUTION: A positioning system includes the first actuators, a controller and the second actuators. The first actuators add the action force to a supporter. The first actuators are combined with the first balance mass(6). The first balance masses are comprised and arranged to absorb the restoring force caused by the action force generated from the first actuators. A controller and the second actuators add the compensation force which compensates the torque induced by the action force applied by the first actuators on the first balance mass.</p> |
