| 摘要 |
A plasma generating apparatus is provided with an impedance matching member, which is connected to a feed line that supplies an antenna element with a high frequency signal, and has variable characteristic parameters for impedance matching; a distribution wiring, which is arranged corresponding to the impedance matching member and connects the impedance matching member with at least two antenna elements; and a control section which changes at the same time impedance matching statuses of at least the two antenna elements connected to the impedance matching member through the distribution wiring by changing the characteristic parameters of the impedance member. Thus, the number of impedance matching devices is smaller than that of the antenna elements, and a mechanism relating to impedance matching is made relatively small.
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