发明名称 |
NOVEL TREATMENT FOR MASK SURFACE CHEMICAL REDUCTION |
摘要 |
A method includes forming an absorption material layer on a mask; applying a plasma treatment to the mask to reduce chemical contaminants after the forming of the absorption material layer; performing a chemical cleaning process of the mask; and performing a gas injection to the mask.
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申请公布号 |
US2009258159(A1) |
申请公布日期 |
2009.10.15 |
申请号 |
US20080100822 |
申请日期 |
2008.04.10 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
SU YIH-CHEN;HSU TING-HAO;CHIN SHENG-CHI;LEE HENG-JEN;HSIEH HUNG CHANG;KU YAO-CHING |
分类号 |
B08B6/00;B05D3/06 |
主分类号 |
B08B6/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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