PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME

摘要

The present invention relates to a photoactive compound having a novel structure expressed in Chemical Formula 1 and to a photosensitive resin composition comprising the same. The photoactive compound of the present invention exhibits high efficiency in absorbing ultraviolet rays and generating radicals, and in photopolymerization with an unsaturated group. The photosensitive resin composition comprising the photoactive compound of the invention exhibits improved sensitivity through efficient absorption of ultraviolet rays, and improved residual film thickness, mechanical strength, heat resistance, chemical resistance and development resistance. Therefore, the photosensitive resin composition of the present invention is advantageous in hardening a column spacer, overcoat, and passivation material of a liquid crystal display, and also in a high temperature process.