| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a member used for a plasma processing apparatus containing ceria as a main component which is excellent in corrosion resistance to halogen-based corrosive gas, plasma and the like, and can suppress impurity metal contamination caused by the constituent material of the ceramic even in a halogen plasma process, and which can preferably be used for a constitutive member in a plasma processing apparatus for manufacturing a semiconductor or liquid crystal in place of a member using yttria. <P>SOLUTION: In the member used for a plasma processing apparatus, at least a portion exposed to plasma is composed of a ceramic in which 3-100 parts by weight of yttria having purity of ≥99% is added to 100 parts by weight of cerium oxide having purity of ≥99%, and the porosity is ≤2%. Alternatively, in the member used for a plasma processing apparatus, at least a portion exposed to plasma is covered with a plasma sprayed film in which 3-30 parts by weight of yttria having purity of ≥99% is added to 100 parts by weight of cerium oxide having purity of ≥99%. <P>COPYRIGHT: (C)2010,JPO&INPIT |
