METHOD FOR FORMING SILICON NITRIDE FILM, METHOD FOR PRODUCING GAS BARRIER FILM, AND GAS BARRIER FILM

摘要

<P>PROBLEM TO BE SOLVED: To provide a dense silicon nitride film having reduced Si-H bonds and having high gas barrier properties. Ž<P>SOLUTION: As raw material gas, silane gas and ammonia gas or nitrogen gas are used, and the effective power calculated by prescribed calculation formula is controlled to 10 to 100 W/sccm to the feed flow rate of the silane gas. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž