发明名称 |
MOLD, PROCESS FOR PRODUCING THE SAME, AND PROCESS FOR PRODUCING SUBSTRATE HAVING TRANSFERRED FINE PATTERN |
摘要 |
<p>A mold is provided which has high light transmission and high releasability and has a fine pattern having a relatively large maximum height. Also provided are: a process for producing the mold; and a process for producing a substrate with a transferred fine pattern using the mold. The mold (10) includes a transparent resin layer (A) (12) constituted of a transparent resin and having chemical bonds based on a functional group (x) in the surface thereof on the interlayer (C) side, an interlayer (C) (14) comprising a fluoropolymer (II) which has a backbone having a fluorinated alicyclic structure and has a reactive group (y) reactive with the functional group (x), and a surface layer (B) (16) comprising a fluoropolymer (I) which has a backbone having a fluorinated alicyclic structure and does not have the reactive group (y), the transparent resin having a glass transition temperature not higher than the glass transition temperatures of the fluoropolymer (I) and the fluoropolymer (II). The fine pattern has a maximum height exceeding the sum of the thickness of the surface layer (B) and the thickness of the interlayer (C).</p> |
申请公布号 |
WO2009125697(A1) |
申请公布日期 |
2009.10.15 |
申请号 |
WO2009JP56732 |
申请日期 |
2009.03.31 |
申请人 |
ASAHI GLASS COMPANY, LIMITED;TSUNOZAKI, KENTAROU;KAWAGUCHI, YASUHIDE;SANO, MIKIHIKO |
发明人 |
TSUNOZAKI, KENTAROU;KAWAGUCHI, YASUHIDE;SANO, MIKIHIKO |
分类号 |
B29C59/02;B29C33/40;G11B5/84;G11B5/855;G11B7/26;H01L21/027 |
主分类号 |
B29C59/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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