| 摘要 |
PROBLEM TO BE SOLVED: To provide a processing system, capable of supplying a raw material gas generated in a material-holding vessel into a treatment apparatus substantially, without causing pressure loss. SOLUTION: This processing system is a treating system, having a treatment apparatus 22 equipped with a gas-jetting means 42 for jetting a predetermined raw material gas, comprising a metal compound material M having a low-vapor pressure into a treatment vessel 26 for subjecting an article W to be treated to a predetermined treatment; and a gas supplying line 24 for supplying the predetermined raw material gas to the gas-jetting means, wherein the gas-jetting means is a showering head part and the gas supply line comprises a gas passage 56, extending upward from the showering head part; the material-holding vessel 58 attached to a top edge part of the gas passage for holding the metal compound material in the inside thereof; and an open/close valve 60 for opening and shutting the gas passage. COPYRIGHT: (C)2010,JPO&INPIT
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