发明名称 METHOD FOR FORMING CONDUCTIVE FILM
摘要 A method for forming a conductive film, includes: applying a dispersion liquid above a substrate, the dispersion liquid including a plurality of conductive fine-particles made of one conductive material selected from the group consisting of copper, nickel, and an alloy that includes copper or nickel as a main component; and forming the conductive film made from the conductive fine-particles, by heating the dispersion liquid that has been applied above the substrate in an atmosphere including formic acid, by baking the conductive fine-particles so that the conductive fine-particles are mutually fusion bonded.
申请公布号 US2009258490(A1) 申请公布日期 2009.10.15
申请号 US20090420265 申请日期 2009.04.08
申请人 SEIKO EPSON CORPORATION 发明人 DENDA ATSUSHI
分类号 H01L21/3205 主分类号 H01L21/3205
代理机构 代理人
主权项
地址