| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a gas feeding device arranged oppositely to a substrate in a treating container and capable of replacing gases in flow passages in the gas feeding device at high speed in gas treating by feeding gas to the substrate. <P>SOLUTION: The gas feeding device includes a body portion forming a substantially conical gas passage space for passing gasses from the side of a radially reduced end to the side of a radially enlarged end, gas introduction ports formed in the gas passage space on the side of the radially reduced end, for introducing the gasses into the gas passage space, and partition members defining the gas passage space concentrically so that the diverging degree of each of the partition members becomes larger toward the outside. As a result, the conductance in the gas passage inside of the gas feeding device can be made larger than that of the gas shower head of the prior art, thereby improving the replaceability of the gases in the gas passage. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
