发明名称 |
STITCHING OF NEAR-NULLED SUBAPERTURE MEASUREMENTS |
摘要 |
<p>A metrology system for measuring aspheric test objects by subaperture stitching. A wavefront-measuring gauge having a limited capture range of wavefront shapes collects partially overlapping subaperture measurements over the test object. A variable optical aberrator reshapes the measurement wavefront with between a limited number of the measurements to maintain the measurement wavefront within the capture range of the wavefront-measuring gauge. Various error compensators are incorporated into a stitching operation to manage residual errors associated with the use of the variable optical aberrator.</p> |
申请公布号 |
WO2009126269(A2) |
申请公布日期 |
2009.10.15 |
申请号 |
WO2009US02191 |
申请日期 |
2009.04.08 |
申请人 |
QED TECHNOLOGIES INTERNATIONAL, INC. |
发明人 |
MURPHY, PAUL;DEVRIES, GARY;BROPHY, CHRISTOPHER;FORBES, GREG |
分类号 |
G01B11/24;G01B7/28;G01B9/02;G01B11/00;G02B13/18;G06F7/00 |
主分类号 |
G01B11/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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