发明名称 |
METHOD FOR FILM FORMATION, APPARATUS FOR FILM FORMATION, AND COMPUTER-READABLE RECORDING MEDIUM |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To improve a film formation speed of a metal film and in-plane uniformity of film thickness thereof while suppressing excessive decomposition of a metal carbonyl material, in a formation method of forming a metal film on a treatment object substrate by supplying a metal carbonyl material along with carbon monoxide. <P>SOLUTION: This method for film formation is characterized by including: running a treatment gas stream containing a metal carbonyl-containing treatment gas and a carbon monoxide-containing carrier gas into a region on the radially upper outside of the outer periphery of a treatment object substrate while avoiding the surface of the treatment object substrate; and diffusing the metal carbonyl from the treatment gas stream into the surface of the treatment object substrate to form a metal film on the surface of the treatment object substrate. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
申请公布号 |
JP2009239104(A) |
申请公布日期 |
2009.10.15 |
申请号 |
JP20080084551 |
申请日期 |
2008.03.27 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
HARA MASAMICHI;MIZUSAWA YASUSHI;TAGA SATOSHI;GOMI ATSUSHI;HATANO TATSUO |
分类号 |
H01L21/285;C23C16/16 |
主分类号 |
H01L21/285 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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