发明名称 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSURE OPTICAL SYSTEM
摘要 An illumination optical system to illuminate an illumination target surface with light from a light source comprises a distribution forming optical system including an optical integrator and forming a pupil intensity distribution on an illumination pupil located behind the optical integrator; and a transmission filter with a transmittance characteristic varying depending upon an angle of incidence of light, which is arranged in an illumination pupil space between an optical element with a power adjacent in front of the illumination pupil and an optical element with a power adjacent behind the illumination pupil and which is arranged at a position of incidence of light to pass through only a partial region of the illumination pupil or light having passed through only a partial region of the illumination pupil.
申请公布号 US2009257043(A1) 申请公布日期 2009.10.15
申请号 US20090371166 申请日期 2009.02.13
申请人 NIKON CORPORATION 发明人 MORI TAKASHI;TANAKA HIROHISA
分类号 G03B27/72 主分类号 G03B27/72
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