发明名称 CONTAMINATION PREVENTION IN EXTREME ULTRAVIOLET LITHOGRAPHY
摘要 Embodiments of the present invention provide methods and apparatus for removing debris particles using a stream of charged species. One embodiment of the present invention provides an apparatus for removing debris particles from a beam of radiation comprising a charged species source configured to dispense electrically charged species, and a collecting plate biased electrically opposite to the charged species from the charged species source, wherein the collecting plate and the charged species source are disposed on opposite sides of the beam of radiation, a stream of charged species from the charged species source to the collecting plate intersects the beam of radiation, the stream of charged species is configured to attach and remove debris particles from the beam of radiation by electrostatic force, and the collecting plate is configured to receive the charged species and the debris particles removed from the beam of radiation.
申请公布号 WO2009091630(A3) 申请公布日期 2009.10.15
申请号 WO2009US30209 申请日期 2009.01.06
申请人 APPLIED MATERIALS, INC.;WU, BANQIU;KUMAR, AJAY 发明人 WU, BANQIU;KUMAR, AJAY
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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