发明名称 METHOD OF SELECTIVELY ETCHING PATTERN WITHIN A GLASS
摘要 PURPOSE: A method for selectively etching a pattern inside a glass is provided to reduce a process cost by selectively forming a pattern inside a glass through a mask and an etching solution. CONSTITUTION: A barrier and a glass are bonded through a bonding agent(S10). A mask is formed on the glass with a predetermined pattern(S20). A part in which the mask is not formed in the glass is selectively etched by injecting an etching solution inside a space formed by the barrier(S30). The barrier is made of an acid-resistant material which is not rusted by the etching solution. The acid-resistant material is one of Teflon, polypropylene, and glass.
申请公布号 KR20090108262(A) 申请公布日期 2009.10.15
申请号 KR20080033597 申请日期 2008.04.11
申请人 INHA-INDUSTRY PARTNERSHIP INSTITUTE 发明人 CHO, MYEONG WOO;KIM, DONG WOO
分类号 H01L21/3063 主分类号 H01L21/3063
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