发明名称 |
METHOD OF SELECTIVELY ETCHING PATTERN WITHIN A GLASS |
摘要 |
PURPOSE: A method for selectively etching a pattern inside a glass is provided to reduce a process cost by selectively forming a pattern inside a glass through a mask and an etching solution. CONSTITUTION: A barrier and a glass are bonded through a bonding agent(S10). A mask is formed on the glass with a predetermined pattern(S20). A part in which the mask is not formed in the glass is selectively etched by injecting an etching solution inside a space formed by the barrier(S30). The barrier is made of an acid-resistant material which is not rusted by the etching solution. The acid-resistant material is one of Teflon, polypropylene, and glass.
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申请公布号 |
KR20090108262(A) |
申请公布日期 |
2009.10.15 |
申请号 |
KR20080033597 |
申请日期 |
2008.04.11 |
申请人 |
INHA-INDUSTRY PARTNERSHIP INSTITUTE |
发明人 |
CHO, MYEONG WOO;KIM, DONG WOO |
分类号 |
H01L21/3063 |
主分类号 |
H01L21/3063 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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