发明名称 Nonvolatile memory devices and methods of fabricating the same
摘要 Nonvolatile memory devices and methods of fabricating the same are provided. In some embodiments, a nonvolatile memory device includes a lower conductive member formed on an upper part of or inside a substrate, a ferroelectric organic layer formed on the lower conductive member, a protective layer formed on the ferroelectric organic layer, and an upper conductive member formed on the protective layer to cross the lower conductive member.
申请公布号 US2009258443(A1) 申请公布日期 2009.10.15
申请号 US20090381987 申请日期 2009.03.18
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 TAKAHIRO YASUE;CHO BYEONG-OK;LEE MOON-SOOK
分类号 H01L21/02 主分类号 H01L21/02
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