发明名称 |
Chemical Mechanical Polishing Pad and Methods of Making and Using Same |
摘要 |
Shape memory chemical mechanical polishing pads are provided, wherein the shape memory chemical mechanical polishing pads comprise a polishing layer in a densified state. Also provided are methods of making the shape memory chemical mechanical polishing pads and for using them to polish substrates.
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申请公布号 |
US2009258575(A1) |
申请公布日期 |
2009.10.15 |
申请号 |
US20080103292 |
申请日期 |
2008.04.15 |
申请人 |
HREHA RICHARD D;PALAPARTHI RAVICHANDRA V;VINING BENJAMIN JOHN |
发明人 |
HREHA RICHARD D;PALAPARTHI RAVICHANDRA V.;VINING BENJAMIN JOHN |
分类号 |
B24B7/04;B24D99/00;B24B29/00;B29C43/02 |
主分类号 |
B24B7/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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