| 摘要 |
<p>PURPOSE: A manufacturing method of a mask blank and a photo mask is provided to improve uniformity of thickness of a coating film by reducing an error of thickness of the coating film in a substrate surface. CONSTITUTION: A resist agent is contacted in a surface to be coated of a substrate(10) having a thin film for forming a transfer pattern. The resist agent is delivered to an opening part of an end of a nozzle after passing a coating nozzle(22) by a capillary phenomenon. A resist film is formed by coating the resist agent on the surface to be coated by relatively moving the substrate and the coating nozzle. In the process for forming the resist film, when the coating nozzle is delivered around a coating finish position of the substrate by a relative movement, a coating condition is changed.</p> |
