发明名称 METHOD FOR MANUFACTURING MAGNETORESISTANCE EFFECT ELEMENT
摘要 <p>A method is for manufacturing a magnetoresistance effect element having a magnetization fixed layer, a non-magnetic intermediate layer, and a magnetization free layer being sequentially stacked. The method includes: forming at least a part of a magnetic layer that is to become either one of the magnetization fixed layer and the magnetization free layer; forming a function layer including at least one of an oxide, a nitride, and a fluoride on the part of the magnetic layer; and removing a part of the function layer by exposing the function layer to either one of an ion beam and plasma irradiation.</p>
申请公布号 KR100922247(B1) 申请公布日期 2009.10.15
申请号 KR20080104637 申请日期 2008.10.24
申请人 发明人
分类号 H01C17/00 主分类号 H01C17/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利