发明名称 Group III Nitride Semiconductor Device and Method for Manufacturing Group III Nitride Semiconductor Device
摘要 A laser diode 300 includes a p-type GaN guide layer 107, a current confinement layer 314 provided on the p-type GaN guide layer 107 and having an opening 314A formed therein, and a p-type cladding layer 108 provided on the current confinement layer 314 and plugging the opening 314A formed in the current confinement layer 314. An interface between the p-type cladding layer 108 and the p-type GaN guide layer 107 is located in a bottom of the opening 314A. The current confinement layer 314 is a layer of a group III nitride semiconductor, and a width dimension of the opening 314A is minimized in the upper side of the opening 314A.
申请公布号 US2009257467(A1) 申请公布日期 2009.10.15
申请号 US20060084937 申请日期 2006.12.05
申请人 NEC CORPORATION 发明人 NANIWAE KOICHI;MASUMOTO ICHIRO
分类号 H01S5/20;H01L21/00 主分类号 H01S5/20
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