| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent imaging noise due to light-caused noise caused at an element under a light shield film by sneaking-in of diffracted light under the light shield film from a light shield opening of a photoelectric conversion region, in a solid-state imaging element having a structure which blocks light incident in a region other than the photoelectric conversion region of a pixel. Ž<P>SOLUTION: A phase shift film 70 which shifts the phase of incident light is formed on the sidewall of the opening 61 of the light shield film 60 in the photoelectric conversion region 31 to cause the diffracted light to the region below the light shield film 60 to generate reductive interference, and thus light shield performance of the region below the light shield film 60 is effectively improved to effectively prevent the imaging noise due to the diffracted light. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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