| 发明名称 |
STAGE DEVICE, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE |
| 摘要 |
Disclosed is an exposure apparatus comprising a movably arranged stage main body (27) which has a mounting surface (45a), and a correction mechanism (15) for correcting the shape of the mounting surface. |
| 申请公布号 |
WO2009125867(A1) |
申请公布日期 |
2009.10.15 |
| 申请号 |
WO2009JP57433 |
申请日期 |
2009.04.13 |
| 申请人 |
NIKON CORPORATION;SHIBAZAKI, YUICHI;YOSHIMOTO, HIROMITSU |
发明人 |
SHIBAZAKI, YUICHI;YOSHIMOTO, HIROMITSU |
| 分类号 |
H01L21/027;G03F7/20;H01L21/68 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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