METHOD FOR FORMING A DIELECTRIC THIN LAYER ON A TITANIUM SUBSTRATE, TITANIUM SUBSTRATE COMPRISING A THIN LAYER AND PRODUCED BY MEANS OF SAID METHOD, AND USE THEREOF

摘要

The invention relates to a method for forming a dielectric thin layer on a titanium substrate, titanium substrates having a thin layer and produced by means of said method, and possible uses. Preferably, a titanium substrate produced according to the invention can be used for electric capacitors and in electronics, for example. The aim of the invention is to provide titanium substrates with dielectric thin layers which can be electrochemically produced and have a constant thickness and an increased relative permittivity across the respective area. In the method according to the invention for forming a dielectric thin layer on titanium substrates, a titanium substrate that has a minimum degree of purity of 99 percent, preferably 99.9 percent, is machined, i.e. polished or modified, on the surface on which the thin layer is to be formed in order to improve and/or clean the surface. Following such a polishing step, an electrochemical oxidation process is carried out by means of an electrolyte that should have a pH value ranging from 4 to 10. A voltage ranging from -1 to 20 volt is applied during the electrochemical oxidation process, the titanium substrate then being connected as an anode.