| 摘要 |
<p>PURPOSE: A dissolution inhibitor and chemical amplification photoresist composition containing the same are provided to control diffusion of acid by light exposure. CONSTITUTION: A dissolution inhibitor is denoted by the chemical formula 1. In the chemical formula 1, R1 is linear, branched, monocyclic, or muticyclic alkyl group of C1-C30. R2 is linear, branched, monocyclic, or multicyclic alkyl group of C1-C20. The photo resist composition contains 3-30 weight% of photosensitive polymer; 1-30 weight parts of dissolution inhibitor; 0.05-10 weight parts of photoacid generator; and residual organic solvent.</p> |
