| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a double-sided photomask, having an aperture pattern capable of obtaining proper measurement values by a transmissive inspection device, while minimizing the effect on the effective area. <P>SOLUTION: The double-sided photomask, having a light-shielding pattern formed on both of exposure effective areas includes a first aperture pattern area 113, which is provided in a first surface non-effective area 112 outside a first surface exposure effective area 111 and has the light-shielding pattern removed therefrom, an etching pattern 114 for inspection formed in the first aperture pattern area 113, and a second aperture pattern area 123, which is provided in the second surface non-effective area, facing the etching pattern 114 for inspection and has the light-shielding pattern removed therefrom. The second aperture pattern 123 is formed into a rectangle, and the length of each side of the rectangle is set to 2 to 6 mm. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
