发明名称 SHEET PLASMA FILM DEPOSITION SYSTEM, AND SHEET PLASMA REGULATION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a sheet plasma film deposition system which can regulate the shape of sheet plasma while maintaining the sheet shape of the sheet plasma. <P>SOLUTION: The sheet plasma film deposition system 1 comprises: a plasma gun 2 having a cathode 11 and further emitting columnar plasma P; a pair of permanent magnets 7 forming sheet plasma P with the columnar plasma P sandwiched; a film deposition chamber 8 into which the sheet plasma P is introduced, and in which a target 13 and a substrate 14 are oppositely arranged so as to sandwich the sheet plasma P to the thickness direction thereof; an anode 12 converging the sheet plasma P; electromagnetic coils 5, 6 forming current magnetic fields at the film deposition chamber 8 and transporting the sheet plasma P from the side of the cathode 11 toward the side of the anode 12; and a magnetic member 9 magnetized when the current magnetic fields are formed and forming a magnetic field inside the film deposition chamber 8. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009235453(A) 申请公布日期 2009.10.15
申请号 JP20080080359 申请日期 2008.03.26
申请人 SHINMAYWA INDUSTRIES LTD 发明人 TERAKURA ATSUHIRO;IWASAKI YASUKUNI;AKASHI DAISUKE;MARUNAKA MASAO;MIYAZAKI NORIAKI;TSUCHIYA TAKAYUKI;NISHIDA ETSURO
分类号 C23C14/46;H05H1/24 主分类号 C23C14/46
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