发明名称 METHOD OF MANUFACTURING OPTICAL SEMICONDUCTOR ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing an optical semiconductor element in which projections contributing to improvement in extraction efficiency of light are formed uniformly on a light emission surface. <P>SOLUTION: The method of manufacturing the optical semiconductor element includes a preprocessing stage of forming a plurality of projections 401 on the light emission surface and a processing stage of subjecting the light emission surface to anisotropic etching 404. The projections 401 are formed in the preprocessing stage and then can be processed by the anisotropic etching 404 in the processing stage, thereby forming the projections 403 so shaped as to improve the extraction efficiency of light uniformly on the light emission surface. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009238879(A) 申请公布日期 2009.10.15
申请号 JP20080080660 申请日期 2008.03.26
申请人 STANLEY ELECTRIC CO LTD 发明人 TANAKA SATOSHI;YANA KICHIKO;YOKOBAYASHI YUSUKE
分类号 H01L33/20;H01L33/22;H01L33/32 主分类号 H01L33/20
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