发明名称 |
METHOD OF MANUFACTURING OPTICAL SEMICONDUCTOR ELEMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing an optical semiconductor element in which projections contributing to improvement in extraction efficiency of light are formed uniformly on a light emission surface. <P>SOLUTION: The method of manufacturing the optical semiconductor element includes a preprocessing stage of forming a plurality of projections 401 on the light emission surface and a processing stage of subjecting the light emission surface to anisotropic etching 404. The projections 401 are formed in the preprocessing stage and then can be processed by the anisotropic etching 404 in the processing stage, thereby forming the projections 403 so shaped as to improve the extraction efficiency of light uniformly on the light emission surface. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2009238879(A) |
申请公布日期 |
2009.10.15 |
申请号 |
JP20080080660 |
申请日期 |
2008.03.26 |
申请人 |
STANLEY ELECTRIC CO LTD |
发明人 |
TANAKA SATOSHI;YANA KICHIKO;YOKOBAYASHI YUSUKE |
分类号 |
H01L33/20;H01L33/22;H01L33/32 |
主分类号 |
H01L33/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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