| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of positioning a target portion of a substrate with respect to a focal plane of a projection system. <P>SOLUTION: The method includes measuring a height of at least a portion of the substrate using a level sensor, and generating height data. A correction height which is specified and/or precalculated is used to calculate corrected height data. Use of the precalculated correction height may be partially based upon process stack data. The position of a substrate table is controlled using the correction height partially based upon a process stack layer, specially upon a process stack layer in a target area. <P>COPYRIGHT: (C)2010,JPO&INPIT |
