| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a photomask, which can stably provide a photomask with high resolution and can suppress development scum (sludge) over a long period. <P>SOLUTION: The method for producing a photomask comprises: exposing imagewise a photomask material having, on a transparent substrate, a photosensitive layer containing at least a light-shielding material and capable of performing image formation with near ultraviolet ray or visible light with near ultraviolet ray or visible light; and developing the exposed photomask material by use of a developer having pH of 8-13 which contains, in the total mass, 1-10 mass% of at least one surfactant selected from the group consisting of anionic surfactants and nonionic surfactants. <P>COPYRIGHT: (C)2010,JPO&INPIT |
