| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method capable of reducing costs by preventing resist from remaining in etching, and to provide a method of forming a contact hole and a method of manufacturing an electrooptical device. Ž<P>SOLUTION: A metal film 3 is formed on a film 2 formed on a base material 1, a resist mask 4 is formed on the metal film 3, and the metal film 3 is dry-etched by the resist mask 4 to form a metal mask 4. In the pattern forming method, the metal mask 4 is used to dry-etch a film for patterning, and the metal mask 4 is removed. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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