| 摘要 |
A hybrid MOS or CMOS image sensor. The sensor includes photon-sensing elements comprised of an array of photo-sensing regions deposited in the form of separate islands on or in a substrate. Pixel circuitry is created on and/or in the substrate at or near the edge of or beneath the photon-sensing elements. The photo-sensing elements may be comprised of multiple photo-sensing semiconductor layers or be created in a single photon-sensing semiconductor layer. Special circuitry is provided to keep the potential across the pixel photon-sensing element at or near zero volts to minimize or eliminate dark current. The potential difference is preferably less than 1.0 volt. The circuitry also keeps the small potential difference across the photodiodes constant or approximately constant throughout the charge collection cycle. In preferred embodiments the substrate is a crystalline substrate and the photon-sensing elements are separated from the substrate by a dielectric material except for a hole at the bottom through which the material of the photon-sensing element can be grown epitaxially from the substrate.
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