| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus capable of suppressing temperature rise in a space between a lower surface of a pressing member and an upper surface of a substrate, by improving uniformity of in-plane temperature of the substrate, even when a high-temperature process liquid is used when the pressing member is arranged, while facing and coming into close proximity to the top surface of the substrate to process it. SOLUTION: A gas passage 84 for circulating a gas from a center region of a plate portion 60 toward a gas exhaust port 80 of a peripheral region is formed inside the plate portion of an atmosphere shutoff plate, arranged while facing and coming into close proximity to the upper surface of the substrate W; midstream of the gas passage is made narrower in part, and a suction pore 128 for communicating the narrow passage portion 126 with a bottom surface side of the plate portion is formed; an ejector portion 116 is provided to the gas passage; and a suction port 130 which open to a lower surface of the plate portion of the suction pore is arranged near the center of the bottom surface of the plate portion than the gas exhaust port. COPYRIGHT: (C)2010,JPO&INPIT |
