| 发明名称 |
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND COMPUTER READABLE MEDIUM FOR STORING PATTERN SIZE SETTING PROGRAM |
| 摘要 |
A method of manufacturing a semiconductor device, which forms a pattern by performing pattern transformation steps multiple times, comprises setting finished pattern sizes for patterns to be formed in each consecutive two pattern transformation steps among the plurality of pattern transformation steps based on a possible total amount of in-plane size variation of the patterns to be formed in the consecutive two pattern transformation steps.
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| 申请公布号 |
US2009258503(A1) |
申请公布日期 |
2009.10.15 |
| 申请号 |
US20090403740 |
申请日期 |
2009.03.13 |
| 申请人 |
MASHITA HIROMITSU;KOTANI TOSHIYA;NAKAJIMA FUMIHARU;TAGUCHI TAKAFUMI;KODAMA CHIKAAKI |
发明人 |
MASHITA HIROMITSU;KOTANI TOSHIYA;NAKAJIMA FUMIHARU;TAGUCHI TAKAFUMI;KODAMA CHIKAAKI |
| 分类号 |
H01L21/306 |
主分类号 |
H01L21/306 |
| 代理机构 |
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