发明名称 Substrate Treatment Device and Substrate Treatment Method
摘要 In order to solve the problem of contamination caused by static electricity on the surface of a substrate after plasma treatment, the invention provides a substrate treatment device comprising a standby chamber in which is arranged a transfer device for loading a substrate out of/into a cassette rack accommodating a substrate, said substrate treatment device capable of retaining said substrate transferred by the transfer device in a boat and loading, by way of a boat elevator, the boat into/out of a treatment furnace capable of applying plasma treatment to said substrate, wherein a static eliminator for eliminating static electricity of said substrate is arranged in said standby chamber.
申请公布号 US2009258507(A1) 申请公布日期 2009.10.15
申请号 US20070991354 申请日期 2007.03.02
申请人 ITOH TAKESHI;TOYODA KAZUYUKI;TAKEBAYASHI YUJI 发明人 ITOH TAKESHI;TOYODA KAZUYUKI;TAKEBAYASHI YUJI
分类号 H01L21/263;C23C16/513 主分类号 H01L21/263
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