LITHOGRAPHIC APPARATUS COMPRISING A CLOSING DEVICE AND DEVICE MANUFACTURING METHOD USING THE SAME

摘要

A lithographic apparatus includes a first chamber that includes a projection system. The projection system is configured to project an image onto a substrate. The lithographic apparatus also includes a second chamber that includes a substrate table. The substrate table is configured to support the substrate. The apparatus further includes a opening between the first chamber and the second chamber. The opening is configured to enable a gas flow between the first chamber and the second chamber. The apparatus also includes a closing device configured to substantially close the opening without completely sealing the opening so that the gas flow between the first chamber and the second chamber is still enabled when the closing device has substantially closed the opening.