| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a shot map generating method that improves the throughput of a photolithography process without lowering the reliability of the semiconductor device. <P>SOLUTION: The shot map generating method includes a step S110 in which shot regions wherein chip regions are arrayed in a matrix are arrayed in a matrix consisting of rows and columns and a plurality of shot regions are arranged as alignment region to generate an initial shot map, a step S120 in which the alignment regions are moved from the initial shot map to generate an alignment region correction shot map, a step S130 in which a second row of chip regions is moved to generate a first shot map, a step S140 in which a second column is moved to generate a second shot map, and a step S150 in which the first shot map and second shot map are compared with each other to acquire a shot map which is larger in number of effective chip regions arranged in an exposure region. <P>COPYRIGHT: (C)2010,JPO&INPIT |
