发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING BLACK MATRIX
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for forming a black matrix capable of forming a highly resistive black matrix and superior in adhesion, curability, and developability. <P>SOLUTION: The photosensitive resin composition for forming the black matrix includes at least a titanium based black pigment, a binder resin, a polyfunctional monomer, a photopolymerization initiator, a dispersant, and a solvent. The photopolymerization initiator includes a prescribed photopolymerization initiator. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009237294(A) 申请公布日期 2009.10.15
申请号 JP20080083542 申请日期 2008.03.27
申请人 THE INCTEC INC;DAINIPPON PRINTING CO LTD;ISHIHARA SANGYO KAISHA LTD 发明人 SUZUKI TAKUMI;SEGAWA HIROAKI;SAWADA MASANORI;SAKAI AKITO;NISHIKAWA TAKASHI;YASUDA YUICHI
分类号 G02B5/20;C08F2/50;G02F1/1335;G03F7/004;G03F7/029;G03F7/031 主分类号 G02B5/20
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