发明名称 METHOD FOR MANUFACTURING ELECTRO-OPTICAL DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To improve an yield when manufacturing an electro-optical device such as a liquid crystal device. Ž<P>SOLUTION: By forming a conductive film along a surface of a first inter-layer insulating film (41), a wall surface of a hole (83a) and a surface of a drain region (1d) exposed from the hole (83a), a contact hole (83) for electrically connecting a lower capacitive electrode (71) and the drain region (1d) to each other is formed in a partial region (72c). Consequently, the drain region (1d) and the lower capacitive electrode (71) can be electrically connected to each other without being obstructed by the conductive film (3a2-1). Then, a TFT array substrate (10) configured by successively forming upper layers of the lower capacitive electrode (71) and a counter substrate (20) are stuck to each other through a liquid crystal layer (50) to manufacture a liquid crystal device (1). Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009237023(A) 申请公布日期 2009.10.15
申请号 JP20080079958 申请日期 2008.03.26
申请人 SEIKO EPSON CORP 发明人 KAWADA HIDENORI
分类号 G02F1/1368;G02F1/1343;G09F9/30 主分类号 G02F1/1368
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