| 摘要 |
A substrate processing device 10 has a substrate transfer chamber 12 for moving, by a horizontal movement mechanism, storage trays 301, 302 for respectively storing one and two of the substrate support trays for supporting substrates in their vertical or substantially vertical state, to a substrate transfer position for effecting the movement of the substrate support trays for carry-in or carry-out purposes between chambers in either a group of substrate processing chambers 16 or a group of load lock chambers ( 20, 22 ). In the case where a defect develops in one load lock chamber of the substrate processing device, the movement of substrate support trays between these chambers is continued without using the one load lock chamber associated with the defect. |
