发明名称 Method of manufacturing display device
摘要 To provide a method of manufacturing a display device having an excellent impact resistance property with high yield, in particular, a method of manufacturing a display device having an optical film that is formed using a plastic substrate. The method of manufacturing a display device includes the steps of: laminating a metal film, an oxide film, and an optical filter on a first substrate; separating the optical filter from the first substrate; attaching the optical filter to a second substrate; forming a layer including a pixel on a third substrate; and attaching the layer including the pixel to the optical filter.
申请公布号 US7601236(B2) 申请公布日期 2009.10.13
申请号 US20040580464 申请日期 2004.11.18
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMASHITA AKIO;FUKUMOTO YUMIKO;GOTO YUUGO
分类号 B29C65/48;G02F1/1335;B29C65/54;B32B37/02;G02F1/1333;G09F9/00;H01L21/70;H01L21/77;H01L21/84;H01L27/12;H01L27/32;H01L51/50;H01L51/56;H05B33/10;H05B33/14 主分类号 B29C65/48
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