发明名称 Capacitorless one transistor DRAM cell, integrated circuitry comprising an array of capacitorless one transistor DRAM cells, and methods of forming lines of capacitorless one transistor DRAM cells
摘要 This invention includes a capacitorless one transistor DRAM cell that includes a pair of spaced source/drain regions received within semiconductive material. An electrically floating body region is disposed between the source/drain regions within the semiconductive material. A first gate spaced is apart from and capacitively coupled to the body region between the source/drain regions. A pair of opposing conductively interconnected second gates are spaced from and received laterally outward of the first gate. The second gates are spaced from and capacitively coupled to the body region laterally outward of the first gate and between the pair of source/drain regions. Methods of forming lines of capacitorless one transistor DRAM cells are disclosed.
申请公布号 US7602001(B2) 申请公布日期 2009.10.13
申请号 US20060488384 申请日期 2006.07.17
申请人 MICRON TECHNOLOGY, INC. 发明人 GONZALEZ FERNANDO
分类号 H01L27/108;H01L21/3205 主分类号 H01L27/108
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