发明名称 |
System and method for photolithography in semiconductor manufacturing |
摘要 |
A method for photolithography in semiconductor manufacturing includes providing a mask with first and second focus planes for a wafer. The wafer includes corresponding first and second wafer regions. The first wafer region receives a first image during a first exposure utilizing the first focus plane. The second wafer region receives a second image during a second exposure utilizing the second focus plane.
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申请公布号 |
US7601466(B2) |
申请公布日期 |
2009.10.13 |
申请号 |
US20050054458 |
申请日期 |
2005.02.09 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
YEN YUNG-SUNG;CHEN KUEI SHUN;HSU CHIA-SUI;CHANG YUH-SEN;LU HSIAO-TZU |
分类号 |
G03F1/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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