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发明名称
Mask design using library of corrections
摘要
Systems, techniques, and approaches to quickly generate mask patterns, synthesize near-fields, and design masks. In one aspect, a mask may be designed by modeling the transmitted field using a library of corrections and a fast field model.
申请公布号
US7603648(B2)
申请公布日期
2009.10.13
申请号
US20050174336
申请日期
2005.06.29
申请人
INTEL CORPORATION
发明人
LIU PENG;SINGH VIVEK;HU BIN
分类号
G06F17/50;G03C5/00;G03F9/00;H01L21/76
主分类号
G06F17/50
代理机构
代理人
主权项
地址
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