| 摘要 |
An exposure apparatus which exposes a substrate to light. An illumination optical system illuminates a mask with illumination light, and a projection optical system projects a pattern of the mask onto the substrate. The illumination light contains a primary component of polarized light and a secondary component of the polarized light, which are perpendicular to each other, and the illumination optical system includes a phase difference adjusting unit configured to adjust a phase difference between the primary component of the polarized light and the secondary component of the polarized light, without changing a direction of the primary component of the polarized light.
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