| 摘要 |
PURPOSE: A substrate processing apparatus is provided to prevent a particle from dropping from a rectification unit to a substrate. CONSTITUTION: A substrate processor(1) includes a process container(2), a substrate input and output unit, a mounting unit(3), a process gas supply unit, a plasma generator, an exhaust device, and a rectification unit(9a). The process container receives a substrate(G). The substrate input and output unit inputs and outputs the substrate formed in a lateral side of the process container. The mounting unit mounts the substrate in the process container. The process gas supply unit supplies the process gas to the process container. The plasma generator generates the plasma of the process gas in the process container. The exhaust unit exhausts the process container. The rectifying unit surrounds the substrate on the mounting unit and includes a moving unit for inputting and outputting the substrate on the mounting unit in the position corresponding to the substrate input and output unit.
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