| 摘要 |
A coil array for an EAS marker deactivation device (10, 10') is formed by stacking planar substrates (16, 18, 20, 22), on each of which a respective array of spiral coils (A11, A12, ...) was formed by a deposition and etching process. The coil array may be a six-by-six square array, four layers thick, with each of the spiral coils consisting of three turns (110A).
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