| 摘要 |
<p>PURPOSE: A method for monitoring a tilt of a pole axis of off-axis illumination is provided to continuously monitor a tilt degree of a pole axis by confirming a position of a pole of off-axis illumination. CONSTITUTION: Monitoring patterns are formed on a photo mask as mask patterns. Wafer patterns(500) in which the monitoring patterns are transferred are formed on a wafer by performing an exposure process using the photo mask. A direction for connecting center positions of each wafer pattern is extracted into a pole axis direction of off-axis illumination applied to exposure. A tilt degree of the pole axis of the off-axis illumination applied to the exposure is extracted from the direction of the extracted pole axis.</p> |
